<?xml version="1.0" encoding="UTF-8"?>
<collection xmlns="http://www.loc.gov/MARC21/slim">
 <record>
  <leader>01131nam a2200229Ia 4500</leader>
  <controlfield tag="001">CTU_238613</controlfield>
  <controlfield tag="008">210402s9999    xx            000 0 und d</controlfield>
  <datafield tag="082" ind1=" " ind2=" ">
   <subfield code="a">530.44</subfield>
  </datafield>
  <datafield tag="082" ind1=" " ind2=" ">
   <subfield code="b">L716</subfield>
  </datafield>
  <datafield tag="100" ind1=" " ind2=" ">
   <subfield code="a">Lieberman, M. A.</subfield>
  </datafield>
  <datafield tag="245" ind1=" " ind2="0">
   <subfield code="a">Principles of plasma discharges and materials processing</subfield>
  </datafield>
  <datafield tag="245" ind1=" " ind2="0">
   <subfield code="c">Michael A. Lieberman, Allan J. Lichtenberg.</subfield>
  </datafield>
  <datafield tag="260" ind1=" " ind2=" ">
   <subfield code="a">Hoboken, N.J.</subfield>
  </datafield>
  <datafield tag="260" ind1=" " ind2=" ">
   <subfield code="b">Wiley-Interscience</subfield>
  </datafield>
  <datafield tag="260" ind1=" " ind2=" ">
   <subfield code="c">2005</subfield>
  </datafield>
  <datafield tag="520" ind1=" " ind2=" ">
   <subfield code="a">The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.</subfield>
  </datafield>
  <datafield tag="526" ind1=" " ind2=" ">
   <subfield code="a">Vật lý plasma và ứng dụng</subfield>
  </datafield>
  <datafield tag="526" ind1=" " ind2=" ">
   <subfield code="b">SP252</subfield>
  </datafield>
  <datafield tag="650" ind1=" " ind2=" ">
   <subfield code="a">Ứng dụng công nghiệp,Plasma chemistry</subfield>
  </datafield>
  <datafield tag="650" ind1=" " ind2=" ">
   <subfield code="x">Hóa học plasma,Industrial applications.</subfield>
  </datafield>
  <datafield tag="910" ind1=" " ind2=" ">
   <subfield code="a">Tuyến</subfield>
  </datafield>
  <datafield tag="980" ind1=" " ind2=" ">
   <subfield code="a">Trung tâm Học liệu Trường Đại học Cần Thơ</subfield>
  </datafield>
 </record>
</collection>
