MOCVD of gallium nitride nanostructures using (N3)2Ga&(CH2)3NR2;, R= Me, Et, as a single molecule precursor : Morphology control and materials characterization - Birkner, Alexander.; Devi, Anjana.; Fischer, Roland A.; Hambrock, Julia.; Khanderi, Jayaprakash.; Parala, Harish.; Wohlfart, Andreas.