Chu, B., Han, B., Ko, S., & Yang, S. Relationship between secondary electrom emissions and film thickness of hydrogenated amorphous silicon.
Citação norma ChicagoChu, Byung-Yoon., Byoung-Sung Han, Seok-Cheol Ko, và Sung-Chae Yang. Relationship between Secondary Electrom Emissions and Film Thickness of Hydrogenated Amorphous Silicon.
Citação norma MLAChu, Byung-Yoon., Byoung-Sung Han, Seok-Cheol Ko, và Sung-Chae Yang. Relationship between Secondary Electrom Emissions and Film Thickness of Hydrogenated Amorphous Silicon.
Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.