एपीए उद्धरण

Einaga, H., Futamura, S., & Ibusuki, T. Improvement of catalyst durability by deposition of RH on TIO2 in photooxidation of aromatic compounds.

शिकागो स्टाइल उद्धरण

Einaga, Hisahiro., Shigeru Futamura, और Takashi Ibusuki. Improvement of Catalyst Durability By Deposition of RH On TIO2 in Photooxidation of Aromatic Compounds.

एमएलए उद्धरण

Einaga, Hisahiro., Shigeru Futamura, और Takashi Ibusuki. Improvement of Catalyst Durability By Deposition of RH On TIO2 in Photooxidation of Aromatic Compounds.

चेतावनी: ये उद्धरण हमेशा 100% सटीक नहीं हो सकते हैं.