Li, X., Johnson, W. P., & Scheibe, T. D. Apparent decreases in colloid deposition rate coefficients with distance of transport under unfavorable deposition conditions: A general phenomenon.
Trích dẫn kiểu ChicagoLi, Xiqing., William P. Johnson, và Timothy D. Scheibe. Apparent Decreases in Colloid Deposition Rate Coefficients With Distance of Transport Under Unfavorable Deposition Conditions: A General Phenomenon.
Deismireacht MLALi, Xiqing., William P. Johnson, và Timothy D. Scheibe. Apparent Decreases in Colloid Deposition Rate Coefficients With Distance of Transport Under Unfavorable Deposition Conditions: A General Phenomenon.
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