Li, X., Johnson, W. P., & Scheibe, T. D. Apparent decreases in colloid deposition rate coefficients with distance of transport under unfavorable deposition conditions: A general phenomenon.
Citação norma ChicagoLi, Xiqing., William P. Johnson, và Timothy D. Scheibe. Apparent Decreases in Colloid Deposition Rate Coefficients With Distance of Transport Under Unfavorable Deposition Conditions: A General Phenomenon.
Citação norma MLALi, Xiqing., William P. Johnson, và Timothy D. Scheibe. Apparent Decreases in Colloid Deposition Rate Coefficients With Distance of Transport Under Unfavorable Deposition Conditions: A General Phenomenon.
Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.