Cita APA

Chang, P., Chang, Y., Chiu, H., & Wu, J. Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3(E= CH, N).

Chicago Style Citation

Chang, Pei-Ju., Yu-Hsu Chang, Hsin-Tien Chiu, i Jin-Bao Wu. Chemical Vapor Deposition of Tantalum Carbide and Carbonitride Thin Films From Me3CETa(CH2CMe3)3(E= CH, N).

Cita MLA

Chang, Pei-Ju., Yu-Hsu Chang, Hsin-Tien Chiu, i Jin-Bao Wu. Chemical Vapor Deposition of Tantalum Carbide and Carbonitride Thin Films From Me3CETa(CH2CMe3)3(E= CH, N).

Atenció: Aquestes cites poden no estar 100% correctes.