Aoki, T., Baszczyk, I., Hatanaka, Y., Klemberg-Sapieha, J. E., Tracz, A., Walkiewicz-Pietrzykowska, A., & Wrobel, A. M. Remote hydrogen-nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films.

Aoki, T., I. Baszczyk, Y. Hatanaka, J. E. Klemberg-Sapieha, A. Tracz, A. Walkiewicz-Pietrzykowska, und A. M. Wrobel. Remote Hydrogen-nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films.

Aoki, T., et al. Remote Hydrogen-nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films.