Cita APA

Aoki, T., Baszczyk, I., Hatanaka, Y., Klemberg-Sapieha, J. E., Tracz, A., Walkiewicz-Pietrzykowska, A., & Wrobel, A. M. Remote hydrogen-nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films.

Chicago Style Citation

Aoki, T., I. Baszczyk, Y. Hatanaka, J. E. Klemberg-Sapieha, A. Tracz, A. Walkiewicz-Pietrzykowska, i A. M. Wrobel. Remote Hydrogen-nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films.

Cita MLA

Aoki, T., et al. Remote Hydrogen-nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films.