APA citiranje

Aoki, T., Baszczyk, I., Hatanaka, Y., Klemberg-Sapieha, J. E., Tracz, A., Walkiewicz-Pietrzykowska, A., & Wrobel, A. M. Remote hydrogen-nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films.

Trích dẫn kiểu Chicago

Aoki, T., I. Baszczyk, Y. Hatanaka, J. E. Klemberg-Sapieha, A. Tracz, A. Walkiewicz-Pietrzykowska, và A. M. Wrobel. Remote Hydrogen-nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films.

MLA citiranje

Aoki, T., et al. Remote Hydrogen-nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films.