Remote hydrogen-nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films /

Antzeko izenburuak

• Hydrogen ion diffusion coefficient of a hydrogenated amorphous silicon thin film /
  nork: Yu, George C.
• Tribological behavior of hydrogenated amorphous carbon films deposited on rubbers /
  nork: Nguyen Kien Cuong.
• Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3(E= CH, N) /
• Tetrathiafulvalene-based conducting deposits on silicon substrates /
• Modified Graphitic Carbon Nitrides for Photocatalytic Hydrogen Evolution from Water: Copolymers, Sensitizers and Nanoparticles
  nork: Striegler, Karl
  Argitaratua: (2015)