Costner, E. A., Jen, W., Lin, M. W., & Willson, C. G. Nanoimprint lithography materials development for semiconductor device fabrication.
シカゴスタイル引用形Costner, Elizabeth A., Wei-Lun Jen, Michael W. Lin, , C. Grant Willson. Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication.
MLA引用形式Costner, Elizabeth A., Wei-Lun Jen, Michael W. Lin, , C. Grant Willson. Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication.
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