Costner, E. A., Jen, W., Lin, M. W., & Willson, C. G. Nanoimprint lithography materials development for semiconductor device fabrication.
Stile di citazione ChicagoCostner, Elizabeth A., Wei-Lun Jen, Michael W. Lin, e C. Grant Willson. Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication.
Citazione MLACostner, Elizabeth A., Wei-Lun Jen, Michael W. Lin, e C. Grant Willson. Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication.
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