Costner, E. A., Jen, W., Lin, M. W., & Willson, C. G. Nanoimprint lithography materials development for semiconductor device fabrication.
Trích dẫn kiểu ChicagoCostner, Elizabeth A., Wei-Lun Jen, Michael W. Lin, và C. Grant Willson. Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication.
MLA引文Costner, Elizabeth A., Wei-Lun Jen, Michael W. Lin, và C. Grant Willson. Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication.
警告:这些引文格式不一定是100%准确.