Tan, C. M. (2010). Electromigration in ULSI Interconnections. Singapore ; Hackensack, NJ: World Scientific.
Chicago Style citaatTan, Cher Ming. Electromigration in ULSI Interconnections. Singapore ; Hackensack, NJ: World Scientific, 2010.
MLA citatieTan, Cher Ming. Electromigration in ULSI Interconnections. Singapore ; Hackensack, NJ: World Scientific, 2010.
Let op: Deze citaties zijn niet altijd 100% accuraat.