Dry Etching Technology for Semiconductors
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which pa...
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Springer
2016
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oai:scholar.dlu.edu.vn:DLU123456789-599672023-11-11T06:58:18Z Dry Etching Technology for Semiconductors Nojiri, Kazuo Engineering Etching Semiconductors Plasma etching This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc. 2016-04-01T01:20:30Z 2016-04-01T01:20:30Z 2015 Book 978-3-319-10295-5 978-3-319-10294-8 https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/59967 en application/pdf Springer |
| institution |
Thư viện Trường Đại học Đà Lạt |
| collection |
Thư viện số |
| language |
English |
| topic |
Engineering Etching Semiconductors Plasma etching |
| spellingShingle |
Engineering Etching Semiconductors Plasma etching Nojiri, Kazuo Dry Etching Technology for Semiconductors |
| description |
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc. |
| format |
Book |
| author |
Nojiri, Kazuo |
| author_facet |
Nojiri, Kazuo |
| author_sort |
Nojiri, Kazuo |
| title |
Dry Etching Technology for Semiconductors |
| title_short |
Dry Etching Technology for Semiconductors |
| title_full |
Dry Etching Technology for Semiconductors |
| title_fullStr |
Dry Etching Technology for Semiconductors |
| title_full_unstemmed |
Dry Etching Technology for Semiconductors |
| title_sort |
dry etching technology for semiconductors |
| publisher |
Springer |
| publishDate |
2016 |
| url |
https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/59967 |
| _version_ |
1819819072873824256 |