Dry Etching Technology for Semiconductors

This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which pa...

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Tác giả chính: Nojiri, Kazuo
Định dạng: Sách
Ngôn ngữ:English
Được phát hành: Springer 2016
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Truy cập trực tuyến:https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/59967
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spelling oai:scholar.dlu.edu.vn:DLU123456789-599672023-11-11T06:58:18Z Dry Etching Technology for Semiconductors Nojiri, Kazuo Engineering Etching Semiconductors Plasma etching This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc. 2016-04-01T01:20:30Z 2016-04-01T01:20:30Z 2015 Book 978-3-319-10295-5 978-3-319-10294-8 https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/59967 en application/pdf Springer
institution Thư viện Trường Đại học Đà Lạt
collection Thư viện số
language English
topic Engineering
Etching
Semiconductors
Plasma etching
spellingShingle Engineering
Etching
Semiconductors
Plasma etching
Nojiri, Kazuo
Dry Etching Technology for Semiconductors
description This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
format Book
author Nojiri, Kazuo
author_facet Nojiri, Kazuo
author_sort Nojiri, Kazuo
title Dry Etching Technology for Semiconductors
title_short Dry Etching Technology for Semiconductors
title_full Dry Etching Technology for Semiconductors
title_fullStr Dry Etching Technology for Semiconductors
title_full_unstemmed Dry Etching Technology for Semiconductors
title_sort dry etching technology for semiconductors
publisher Springer
publishDate 2016
url https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/59967
_version_ 1819819072873824256