Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
For the first time, simultaneous iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater were achieved using forward osmosis because iodide is a precious material and boron is toxic with 1 mg/L discharge standard in Taiwan. Cellulose triacetate and thin-film com...
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Định dạng: | Journal article |
Ngôn ngữ: | English |
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2023
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Truy cập trực tuyến: | https://scholar.dlu.edu.vn/handle/123456789/2992 https://www.sciencedirect.com/science/article/pii/S095965262030634X |
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oai:scholar.dlu.edu.vn:123456789-29922023-09-28T03:22:37Z Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis Chang, Hau-Ming Chen, Shiao-Shing Cai, Zhi-Sheng Chang, Wen-Shing Ray, Saikat Sinha Nguyen Cong Nguyen Li, Chi-Wang Paswan, Mithilesh Forward osmosis; Iodide; Boron; Cetyltrimethylammonium bromide; Membrane distillation For the first time, simultaneous iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater were achieved using forward osmosis because iodide is a precious material and boron is toxic with 1 mg/L discharge standard in Taiwan. Cellulose triacetate and thin-film composite with aquaporin flat sheet membranes were tested for different feed solution, pH levels, and draw solution concentrations. The results indicated that the thin-film composite membrane had high boron and iodide rejections (98.4% and 98.3%, respectively) at a pH of 11; however, with a feed boron concentration of 600 mg/L, 9.8 mg/L boron was still present in the draw solution. Cationic surfactant cetyltrimethylammonium bromide was used to enhance the iodide recovery and boron removal efficiencies. Both efficiencies increased to 99.9% with 0.5 mM cetyltrimethylammonium bromide, and only 0.64 mg/L boron was present in the draw solution. In addition, negligible flux reduction was observed for forward osmosis process in the presence of cetyltrimethylammonium bromide. A membrane distillation system was used to concentrate and purify the MgCl2 draw solution. Thus, the hybrid forward osmosis-membrane distillation process can be applied for iodide recovery and boron removal in the thin-film transistor liquid crystal display industry. 2023-09-28T03:22:35Z 2023-09-28T03:22:35Z 2020 Journal article Bài báo đăng trên tạp chí thuộc ISI, bao gồm book chapter 0959-6526 https://scholar.dlu.edu.vn/handle/123456789/2992 10.1016/j.jclepro.2020.120587 https://www.sciencedirect.com/science/article/pii/S095965262030634X en |
institution |
Thư viện Trường Đại học Đà Lạt |
collection |
Thư viện số |
language |
English |
topic |
Forward osmosis; Iodide; Boron; Cetyltrimethylammonium bromide; Membrane distillation |
spellingShingle |
Forward osmosis; Iodide; Boron; Cetyltrimethylammonium bromide; Membrane distillation Chang, Hau-Ming Chen, Shiao-Shing Cai, Zhi-Sheng Chang, Wen-Shing Ray, Saikat Sinha Nguyen Cong Nguyen Li, Chi-Wang Paswan, Mithilesh Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis |
description |
For the first time, simultaneous iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater were achieved using forward osmosis because iodide is a precious material and boron is toxic with 1 mg/L discharge standard in Taiwan. Cellulose triacetate and thin-film composite with aquaporin flat sheet membranes were tested for different feed solution, pH levels, and draw solution concentrations. The results indicated that the thin-film composite membrane had high boron and iodide rejections (98.4% and 98.3%, respectively) at a pH of 11; however, with a feed boron concentration of 600 mg/L, 9.8 mg/L boron was still present in the draw solution. Cationic surfactant cetyltrimethylammonium bromide was used to enhance the iodide recovery and boron removal efficiencies. Both efficiencies increased to 99.9% with 0.5 mM cetyltrimethylammonium bromide, and only 0.64 mg/L boron was present in the draw solution. In addition, negligible flux reduction was observed for forward osmosis process in the presence of cetyltrimethylammonium bromide. A membrane distillation system was used to concentrate and purify the MgCl2 draw solution. Thus, the hybrid forward osmosis-membrane distillation process can be applied for iodide recovery and boron removal in the thin-film transistor liquid crystal display industry. |
format |
Journal article |
author |
Chang, Hau-Ming Chen, Shiao-Shing Cai, Zhi-Sheng Chang, Wen-Shing Ray, Saikat Sinha Nguyen Cong Nguyen Li, Chi-Wang Paswan, Mithilesh |
author_facet |
Chang, Hau-Ming Chen, Shiao-Shing Cai, Zhi-Sheng Chang, Wen-Shing Ray, Saikat Sinha Nguyen Cong Nguyen Li, Chi-Wang Paswan, Mithilesh |
author_sort |
Chang, Hau-Ming |
title |
Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis |
title_short |
Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis |
title_full |
Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis |
title_fullStr |
Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis |
title_full_unstemmed |
Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis |
title_sort |
iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis |
publishDate |
2023 |
url |
https://scholar.dlu.edu.vn/handle/123456789/2992 https://www.sciencedirect.com/science/article/pii/S095965262030634X |
_version_ |
1778792470336765952 |