Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis

For the first time, simultaneous iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater were achieved using forward osmosis because iodide is a precious material and boron is toxic with 1 mg/L discharge standard in Taiwan. Cellulose triacetate and thin-film com...

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Những tác giả chính: Chang, Hau-Ming, Chen, Shiao-Shing, Cai, Zhi-Sheng, Chang, Wen-Shing, Ray, Saikat Sinha, Nguyen Cong Nguyen, Li, Chi-Wang, Paswan, Mithilesh
Định dạng: Journal article
Ngôn ngữ:English
Được phát hành: 2023
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Truy cập trực tuyến:https://scholar.dlu.edu.vn/handle/123456789/2992
https://www.sciencedirect.com/science/article/pii/S095965262030634X
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spelling oai:scholar.dlu.edu.vn:123456789-29922023-09-28T03:22:37Z Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis Chang, Hau-Ming Chen, Shiao-Shing Cai, Zhi-Sheng Chang, Wen-Shing Ray, Saikat Sinha Nguyen Cong Nguyen Li, Chi-Wang Paswan, Mithilesh Forward osmosis; Iodide; Boron; Cetyltrimethylammonium bromide; Membrane distillation For the first time, simultaneous iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater were achieved using forward osmosis because iodide is a precious material and boron is toxic with 1 mg/L discharge standard in Taiwan. Cellulose triacetate and thin-film composite with aquaporin flat sheet membranes were tested for different feed solution, pH levels, and draw solution concentrations. The results indicated that the thin-film composite membrane had high boron and iodide rejections (98.4% and 98.3%, respectively) at a pH of 11; however, with a feed boron concentration of 600 mg/L, 9.8 mg/L boron was still present in the draw solution. Cationic surfactant cetyltrimethylammonium bromide was used to enhance the iodide recovery and boron removal efficiencies. Both efficiencies increased to 99.9% with 0.5 mM cetyltrimethylammonium bromide, and only 0.64 mg/L boron was present in the draw solution. In addition, negligible flux reduction was observed for forward osmosis process in the presence of cetyltrimethylammonium bromide. A membrane distillation system was used to concentrate and purify the MgCl2 draw solution. Thus, the hybrid forward osmosis-membrane distillation process can be applied for iodide recovery and boron removal in the thin-film transistor liquid crystal display industry. 2023-09-28T03:22:35Z 2023-09-28T03:22:35Z 2020 Journal article Bài báo đăng trên tạp chí thuộc ISI, bao gồm book chapter 0959-6526 https://scholar.dlu.edu.vn/handle/123456789/2992 10.1016/j.jclepro.2020.120587 https://www.sciencedirect.com/science/article/pii/S095965262030634X en
institution Thư viện Trường Đại học Đà Lạt
collection Thư viện số
language English
topic Forward osmosis; Iodide; Boron; Cetyltrimethylammonium bromide; Membrane distillation
spellingShingle Forward osmosis; Iodide; Boron; Cetyltrimethylammonium bromide; Membrane distillation
Chang, Hau-Ming
Chen, Shiao-Shing
Cai, Zhi-Sheng
Chang, Wen-Shing
Ray, Saikat Sinha
Nguyen Cong Nguyen
Li, Chi-Wang
Paswan, Mithilesh
Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
description For the first time, simultaneous iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater were achieved using forward osmosis because iodide is a precious material and boron is toxic with 1 mg/L discharge standard in Taiwan. Cellulose triacetate and thin-film composite with aquaporin flat sheet membranes were tested for different feed solution, pH levels, and draw solution concentrations. The results indicated that the thin-film composite membrane had high boron and iodide rejections (98.4% and 98.3%, respectively) at a pH of 11; however, with a feed boron concentration of 600 mg/L, 9.8 mg/L boron was still present in the draw solution. Cationic surfactant cetyltrimethylammonium bromide was used to enhance the iodide recovery and boron removal efficiencies. Both efficiencies increased to 99.9% with 0.5 mM cetyltrimethylammonium bromide, and only 0.64 mg/L boron was present in the draw solution. In addition, negligible flux reduction was observed for forward osmosis process in the presence of cetyltrimethylammonium bromide. A membrane distillation system was used to concentrate and purify the MgCl2 draw solution. Thus, the hybrid forward osmosis-membrane distillation process can be applied for iodide recovery and boron removal in the thin-film transistor liquid crystal display industry.
format Journal article
author Chang, Hau-Ming
Chen, Shiao-Shing
Cai, Zhi-Sheng
Chang, Wen-Shing
Ray, Saikat Sinha
Nguyen Cong Nguyen
Li, Chi-Wang
Paswan, Mithilesh
author_facet Chang, Hau-Ming
Chen, Shiao-Shing
Cai, Zhi-Sheng
Chang, Wen-Shing
Ray, Saikat Sinha
Nguyen Cong Nguyen
Li, Chi-Wang
Paswan, Mithilesh
author_sort Chang, Hau-Ming
title Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
title_short Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
title_full Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
title_fullStr Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
title_full_unstemmed Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
title_sort iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
publishDate 2023
url https://scholar.dlu.edu.vn/handle/123456789/2992
https://www.sciencedirect.com/science/article/pii/S095965262030634X
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