Nanoscale CMOS VLSI Circuits: Design for Manufacturability /

Cutting-Edge CMOS VLSI Design for Manufacturability Techniques

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Prif Awdur: Kundu Sandip
Awduron Eraill: Sreedhar Aswin
Fformat: Llyfr
Iaith:Vietnamese
Cyhoeddwyd: NewYork : Mc Graw-Hill , 2010
Pynciau:
Tagiau: Ychwanegu Tag
Dim Tagiau, Byddwch y cyntaf i dagio'r cofnod hwn!
Thư viện lưu trữ: Thư viện Trường CĐ Kỹ Thuật Cao Thắng
Disgrifiad
Crynodeb:Cutting-Edge CMOS VLSI Design for Manufacturability Techniques
This detailed guide offers proven methods for optimizing circuit designs to increase the yield, reliability, and manufacturability of products and mitigate defects and failure. Covering the latest devices, technologies, and processes, Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on delivering higher performance and lower power consumption. Costs, constraints, and computational efficiencies are also discussed in the practical resource.
Nanoscale CMOS VLSI Circuits covers:
Current trends in CMOS VLSI design
Dr. Sandip Kundu is a professor in the Electrical and Computer Engineering Department at the University of Massachusetts at Amherst, specializing in semiconductor and lithographic manufacturing.
Dr. Aswin Sreedhar is a research assistant at the Electrical and Computer Engineering Department at the University of Massachusetts.
Disgrifiad Corfforoll:316tr.
ISBN:007163519X