Chemical solution deposition of semiconductor films

Codi QR

Chemical solution deposition of semiconductor films

Guardat en:

Dades bibliogràfiques
Autor principal:	Gary Hodes
Idioma:	Undetermined English
Publicat:	New York Marcel Dekker 2002
Matèries:	Semiconductor films; Plating baths
Etiquetes:	Afegir etiqueta Sense etiquetes, Sigues el primer a etiquetar aquest registre!

Thư viện lưu trữ:	Trung tâm Học liệu Trường Đại học Trà Vinh

Ítems similars

Clean
per: Smith, Virginia
Publicat: (2007)

Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass /

Chemical vapour deposition of group Vb metal phosphide thin films /

Thin-film deposition of polymers by vacuum degradation /
per: Gritsenko, Konstantin P.

Comparative performances of ni - sic composite coatings deposited by conventional and brush electroplating /

Fundamentals of semiconductors : physics and materials properties /
per: Yu, Peter Y., 1944-
Publicat: (2001)

Semiconductors
per: Hannay, N. B.
Publicat: (1959)

Atomic layer deposition of tin monosulfide thin films /

Impurities in semiconductors :
per: Fistul, Victor I.
Publicat: (2004)

Semiconductor devices :
per: Sze, S. M.
Publicat: (2002)

An introduction to semiconductors
per: Close, K. J.
Publicat: (1971)

Semiconductor Superlattices: Growth and Electronic Properties /
per: Grahn H T
Publicat: (1995)

Semiconductor devices : basic principles /
per: Singh, Jasprit.
Publicat: (2001)

Semiconductor measurements and instrumentation
per: Runyan, W. R.
Publicat: (1975)

Handbook of semiconductor electronics :
per: Hunter, Lloyd P.
Publicat: (1956)

Handbook of semiconductor electronics :
per: Hunter, Lloyd P.
Publicat: (1962)

Introduction to semiconductor devices
per: Morant, M. J.
Publicat: (1970)

Encyclopedia of semiconductor technology
per: Grayson, Martin
Publicat: (1984)

Physics of semiconductor devices
per: Sze, S. M.
Publicat: (1981)

Physics and technology of semiconductor
per: Grove, A. S.
Publicat: (1967)

Theory of plates and shells /
per: Timoshenko, Stephen, 1878-1972.
Publicat: (1970)

Basic semiconductor physics /
per: Hamaguchi, Chihiro, 1937-
Publicat: (2001)

Fabrication of integrated microelectrodes for electrochemical detection on electrophoresis microchip by electroless deposition and micromolding in capillary technique /

Remote hydrogen-nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films /

A short guide to writing about film /
per: Corrigan, Timothy.
Publicat: (1998)

An introduction to the physics of semiconductor devices
per: David J. Roulston
Publicat: (1999)

The Caves of Burnsville Cove, Virginia Fifty Years of Exploration and Science
per: White, William B
Publicat: (2015)

Electrochemically deposited sol-gel-derived silicate films as a viable alternative in thin-film design /

Semiconductor lasers :
Publicat: (1998)

The Semiconductor Industry :
Publicat: (1985)

Growth of nanowires of beta-NaxV2O5 by metalorganic chemical vapor deposition /
per: Sahana, M. B.

Preparation of TiO2 thin films on polystyrene by liquid phase deposition /
per: Dutschke, Anke.

Semiconductor surfaces and interfaces /
per: Monch, Winfried.
Publicat: (2001)

The properties, physics, and design of semiconductor devices
per: Shive, John N.
Publicat: (1959)

Optical properties and band structure of semiconductors
per: Greenaway, David L.
Publicat: (1968)

Hydrogen ion diffusion coefficient of a hydrogenated amorphous silicon thin film /
per: Yu, George C.

Fundamentals semiconductor devices
per: Anderson, Betty Lise
Publicat: (2005)

Attaining preeminence in semiconductors
Publicat: (1992)

The Japanese semiconductor industry :
per: Yui, Kimura
Publicat: (1988)

Fundamentals of semiconductor devices
per: Anderson, Betty Lise
Publicat: (2005)