A VERY LOW BANDGAP LINE-TUNNEL FIELD EFFECT TRANSISTOR WITH CHANNEL-BURIED OXIDE AND LATERALLY DOPED POCKET
Low bandgap and line tunneling techniques have demonstrated the most effectiveness in enhancing the on-current of tunnel field-effect transistors (TFETs). This study examines the mechanisms and designs of channel-buried oxide and a laterally doped pocket for a very low bandgap line-TFET. Numerical T...
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| Päätekijät: | , , |
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| Aineistotyyppi: | Artikkeli |
| Kieli: | English |
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Trường Đại học Đà Lạt
2024
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| Linkit: | https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/256919 https://tckh.dlu.edu.vn/index.php/tckhdhdl/article/view/1313 |
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| Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
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