A VERY LOW BANDGAP LINE-TUNNEL FIELD EFFECT TRANSISTOR WITH CHANNEL-BURIED OXIDE AND LATERALLY DOPED POCKET

Low bandgap and line tunneling techniques have demonstrated the most effectiveness in enhancing the on-current of tunnel field-effect transistors (TFETs). This study examines the mechanisms and designs of channel-buried oxide and a laterally doped pocket for a very low bandgap line-TFET. Numerical T...

पूर्ण विवरण

में बचाया:
ग्रंथसूची विवरण
मुख्य लेखकों: Bui, Huu Thai, Shih, Chun-Hsing, Nguyen, Dang Chien
स्वरूप: लेख
भाषा:English
प्रकाशित: Trường Đại học Đà Lạt 2024
विषय:
ऑनलाइन पहुंच:https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/256919
https://tckh.dlu.edu.vn/index.php/tckhdhdl/article/view/1313
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