Improvement of catalyst durability by deposition of RH on TIO2 in photooxidation of aromatic compounds /
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| Hlavní autor: | Einaga, Hisahiro. |
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| Další autoři: | Futamura, Shigeru., Ibusuki, Takashi. |
| Médium: | Článek |
| Jazyk: | English |
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| Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
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