Deposition of thin films of cobalt oxides by MOCVD /
Uloženo v:
| Hlavní autor: | Gulino, Antonino. |
|---|---|
| Další autoři: | Fiorito, Giuseppe., Fragala, Ignazio. |
| Médium: | Článek |
| Jazyk: | English |
| Témata: | |
| Tagy: |
Přidat tag
Žádné tagy, Buďte první, kdo otaguje tento záznam!
|
| Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
|---|
Podobné jednotky
- Room temperature deposition of a TiO2 thin film from aqueous peroxotitanate solution /
- Synthesis and characterization of cerium oxide nanoparticles coated with turbostratic boron nitride /
- Deposition of Ru and RuO2 thin films employing dicarbonyl bis-diketonate ruthenium complexes as CVD source reagents /
- Preparation and properties of zinc oxide nanoparticles coated with zinc aluminate/
- The deposition of thin films of CuME2 by CVD techniques (M= In, Ga and E= S, Se) /