Atmospheric pressure chemical vapour deposition of Cr2-xTixO3(CTO) thin films (<=3 mmm) on to gas sensing substrates /

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Atmospheric pressure chemical vapour deposition of Cr2-xTixO3(CTO) thin films (<=3 mmm) on to gas sensing substrates /

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Bibliographische Detailangaben
1. Verfasser:	Shaw, Graham A.
Weitere Verfasser:	Parkin, Ivan P., Williams, David E.
Format:	Artikel
Sprache:	English
Schlagworte:	Activation energy Inorganic compounds Ternary compounds Thin films Titanium chlorides Transition element compounds
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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