Atmospheric pressure chemical vapour deposition of Cr2-xTixO3(CTO) thin films (<=3 mmm) on to gas sensing substrates /

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Atmospheric pressure chemical vapour deposition of Cr2-xTixO3(CTO) thin films (<=3 mmm) on to gas sensing substrates /

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Dettagli Bibliografici
Autore principale:	Shaw, Graham A.
Altri autori:	Parkin, Ivan P., Williams, David E.
Natura:	Articolo
Lingua:	English
Soggetti:	Activation energy Inorganic compounds Ternary compounds Thin films Titanium chlorides Transition element compounds
Tags:	Aggiungi Tag Nessun Tag, puoi essere il primo ad aggiungerne! !

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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