Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor

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Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor

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Chi tiết về thư mục
Những tác giả chính:	Zhengwen Li, Antti Rahtu, Roy G. Gordon
Định dạng:	Bài viết
Ngôn ngữ:	Vietnamese
Được phát hành:	2015
Truy cập trực tuyến:	http://thuvien.ued.udn.vn/handle/TVDHSPDN_123456789/10771
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Thư viện lưu trữ:	Trung tâm Học liệu và E-Learning, Trường Đại học Sư phạm – Đại học Đà Nẵng

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