Handbook of semiconductor manufacturing technology

New to the second edition of this reference are sections on silicon-on-insulator (SOI) materials and devices, supercritical CO2 in semiconductor cleaning, low-'5f dielectrics, atomic-layer deposition, Damascene copper electroplating, and effects of terrestrial radiation on integrated circuits....

সম্পূর্ণ বিবরণ

সংরক্ষণ করুন:
গ্রন্থ-পঞ্জীর বিবরন
প্রধান লেখক: Doering, Robert
বিন্যাস: গ্রন্থ
ভাষা:Undetermined
প্রকাশিত: Boca Raton CRC Press 2008
বিষয়গুলি:
ট্যাগগুলো: ট্যাগ যুক্ত করুন
কোনো ট্যাগ নেই, প্রথমজন হিসাবে ট্যাগ করুন!
Thư viện lưu trữ: Trung tâm Học liệu Trường Đại học Cần Thơ
বিবরন
সংক্ষিপ্ত:New to the second edition of this reference are sections on silicon-on-insulator (SOI) materials and devices, supercritical CO2 in semiconductor cleaning, low-'5f dielectrics, atomic-layer deposition, Damascene copper electroplating, and effects of terrestrial radiation on integrated circuits. The handbook contains 35 chapters, each containing an overview of as many key topics in the industry. The chapters present background, research-and-development issues, and future trends and are written so as to be accessible to the non-specialist as well as the specialists and students in the industry who will be the work's main audience. The range of chapter topics includes dopant diffusion, silicides, rapid thermal processing, atomic layer deposition, yield modeling, yield management, failure analysis, and factory modeling. Four appendices contain physical constants, units conversion, standards, and acronyms.