Mono- and multilayer formation by diazonium reduction on carbon surfaces monitored with atomic force microscopy scratching /

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Mono- and multilayer formation by diazonium reduction on carbon surfaces monitored with atomic force microscopy scratching /

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Opis bibliograficzny
1. autor:	Anariba, Franklin.
Kolejni autorzy:	DuVall, Stacy H., McCreery, Richard L.
Format:	Artykuł
Język:	English
Hasła przedmiotowe:	Atomic force microscopy Diazonium compounds Monolayer Multilayer Photoresist
Etykiety:	Dodaj etykietę Nie ma etykietki, Dołącz pierwszą etykiete!

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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