Mono- and multilayer formation by diazonium reduction on carbon surfaces monitored with atomic force microscopy scratching /

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Mono- and multilayer formation by diazonium reduction on carbon surfaces monitored with atomic force microscopy scratching /

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Bibliografski detalji
Glavni autor:	Anariba, Franklin.
Daljnji autori:	DuVall, Stacy H., McCreery, Richard L.
Format:	Članak
Jezik:	English
Teme:	Atomic force microscopy Diazonium compounds Monolayer Multilayer Photoresist
Oznake:	Dodaj oznaku Bez oznaka, Budi prvi tko označuje ovaj zapis!

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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