Handbook of Plasma Processing Technology - Fundamentals, Etching, Deposition, and Surface Interactions
This book provides a perspective look at a range of thin film plasma processing technologies.
Uloženo v:
Hlavní autoři: | Rossnagel, Stephen M., Cuomo, Jenome J., Westwood, William D. |
---|---|
Médium: | Kniha |
Jazyk: | English |
Vydáno: |
Noyes Publications
2011
|
Témata: | |
On-line přístup: | https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/25172 |
Tagy: |
Přidat tag
Žádné tagy, Buďte první, kdo otaguje tento záznam!
|
Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
---|
Podobné jednotky
-
Dry Etching Technology for Semiconductors
Autor: Nojiri, Kazuo
Vydáno: (2016) -
Handbook of physical vapor deposition (PVD) processing :
Autor: Mattox, D. M.
Vydáno: (1998) - Remote hydrogen-nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films /
-
Handbook of thin-film deposition processes and techniques :
Vydáno: (2002) -
Analysis of solution-deposited alkali ions by cluster surface collisions /
Autor: Eusepi, F.