Handbook of Plasma Processing Technology - Fundamentals, Etching, Deposition, and Surface Interactions
This book provides a perspective look at a range of thin film plasma processing technologies.
Сохранить в:
Главные авторы: | Rossnagel, Stephen M., Cuomo, Jenome J., Westwood, William D. |
---|---|
Формат: | |
Язык: | English |
Опубликовано: |
Noyes Publications
2011
|
Предметы: | |
Online-ссылка: | https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/25172 |
Метки: |
Добавить метку
Нет меток, Требуется 1-ая метка записи!
|
Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
---|
Схожие документы
-
Dry Etching Technology for Semiconductors
по: Nojiri, Kazuo
Опубликовано: (2016) -
Handbook of physical vapor deposition (PVD) processing :
по: Mattox, D. M.
Опубликовано: (1998) - Remote hydrogen-nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films /
-
Handbook of thin-film deposition processes and techniques :
Опубликовано: (2002) -
Analysis of solution-deposited alkali ions by cluster surface collisions /
по: Eusepi, F.