Apparent decreases in colloid deposition rate coefficients with distance of transport under unfavorable deposition conditions : A general phenomenon /
保存先:
| 第一著者: | Li, Xiqing. |
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| その他の著者: | Johnson, William P., Scheibe, Timothy D. |
| フォーマット: | 論文 |
| 言語: | English |
| 主題: | |
| タグ: |
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| Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
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