Apparent decreases in colloid deposition rate coefficients with distance of transport under unfavorable deposition conditions : A general phenomenon /
Đã lưu trong:
| Hovedforfatter: | Li, Xiqing. |
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| Andre forfattere: | Johnson, William P., Scheibe, Timothy D. |
| Format: | Bài viết |
| Sprog: | English |
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| Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
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