Apparent decreases in colloid deposition rate coefficients with distance of transport under unfavorable deposition conditions : A general phenomenon /

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Apparent decreases in colloid deposition rate coefficients with distance of transport under unfavorable deposition conditions : A general phenomenon /

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Opis bibliograficzny
1. autor:	Li, Xiqing.
Kolejni autorzy:	Johnson, William P., Scheibe, Timothy D.
Format:	Artykuł
Język:	English
Hasła przedmiotowe:	Aqueous solutions Colloidal materials Digital simulation Mass balance
Etykiety:	Dodaj etykietę Nie ma etykietki, Dołącz pierwszą etykiete!

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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