Apparent decreases in colloid deposition rate coefficients with distance of transport under unfavorable deposition conditions : A general phenomenon /
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| Huvudupphovsman: | Li, Xiqing. |
|---|---|
| Övriga upphovsmän: | Johnson, William P., Scheibe, Timothy D. |
| Materialtyp: | Artikel |
| Språk: | English |
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| Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
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