On-current limitation of high-k gate insulator MOSFETs

This work explores the limitation of high-k gate insulator on improving the driving currents of MOSFET devices. The use of high-k gate dielectric prevents from the gate tunneling current to have an acceptable equivalent oxide thickness (EOT) in scaled MOSFETs. However, the effectiveness of continued...

पूर्ण विवरण

में बचाया:
ग्रंथसूची विवरण
मुख्य लेखकों: Chun-Hsing Shih, Jhong-Sheng Wang, Nguyễn, Đăng Chiến, Ruei-Kai Shia
स्वरूप: Journal article
भाषा:English
प्रकाशित: Elsevier 2024
विषय:
ऑनलाइन पहुंच:https://scholar.dlu.edu.vn/handle/123456789/3296
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