Handbook of physical vapor deposition (PVD) processing : Film formation, adhesion, surface preparation and contamination control
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that...
保存先:
| 第一著者: | |
|---|---|
| フォーマット: | 図書 |
| 言語: | Undetermined |
| 出版事項: |
Westwood, N.J.
Noyes Publications
1998
|
| 主題: | |
| タグ: |
タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
|
| Thư viện lưu trữ: | Trung tâm Học liệu Trường Đại học Cần Thơ |
|---|
| 要約: | This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. |
|---|