Roles of gate-oxide thickness reduction in scaling bulk and thin-body tunnel field-effect transistors

Tunnel field-effect transistor (TFET) has recently been considered as a promising candidate for low-power integrated circuits. In this paper, we present an adequate examination on the roles of gate-oxide thickness reduction in scaling bulk and thin-body TFETs. It is shown that the short-channel perf...

पूर्ण विवरण

में बचाया:
ग्रंथसूची विवरण
मुख्य लेखकों: Nguyễn, Đăng Chiến, Dao Thi Kim Anh, Chun-Hsing Shih
स्वरूप: Journal article
भाषा:English
प्रकाशित: 2023
विषय:
ऑनलाइन पहुंच:https://scholar.dlu.edu.vn/handle/123456789/2076
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