Dopant-segregated metal source tunnel field-effect transistors with Schottky barrier and band-to-band tunneling

Metallic junction engineering and tunnel field-effect architecture are the two major techniques to resolve the power dissipation issue of future transistor technologies. This work explores the on-off switching of metal source tunnel field-effect transistors. Two prime factors, source workfunction an...

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Những tác giả chính: Chun-Hsing Shih, Ting-Shiuan Kang, Yu-Hsuan Chen, Hung-Jin Teng, Nguyễn, Đăng Chiến
Định dạng: Conference paper
Ngôn ngữ:English
Được phát hành: IEEE Publishing 2024
Truy cập trực tuyến:https://scholar.dlu.edu.vn/handle/123456789/3315
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spelling oai:scholar.dlu.edu.vn:123456789-33152024-03-02T11:56:06Z Dopant-segregated metal source tunnel field-effect transistors with Schottky barrier and band-to-band tunneling Chun-Hsing Shih Ting-Shiuan Kang Yu-Hsuan Chen Hung-Jin Teng Nguyễn, Đăng Chiến Metallic junction engineering and tunnel field-effect architecture are the two major techniques to resolve the power dissipation issue of future transistor technologies. This work explores the on-off switching of metal source tunnel field-effect transistors. Two prime factors, source workfunction and dopants segregation, are utilized to optimize the subthreshold swing and on-current for serving as ideal energy-efficient devices. 53-54 2024-03-02T11:55:59Z 2024-03-02T11:55:59Z 2017 Conference paper Bài báo đăng trên KYHT quốc tế (có ISBN) 978-1-5386-4638-0 2161-4644 https://scholar.dlu.edu.vn/handle/123456789/3315 10.23919/SNW.2017.8242293 en Silicon Nanoelectronics Workshop (SNW) [I] A. Seabaugh, "The Tunneling Transistor," IEEE Spectrum, vol. 50, vo. 10, pp. 35-62, 2013. [2] J. M. Larson and J. P. Snyder, "Overview and statos of metal sm Schottky barrier MOSFET technology,"IEEE TED, vol. 53, pp. 1048-1058, May 2006. [3] Synopsys Sentaurus Device User Guide, Synopsys Inc., Mountain View, CA, USA, 2013. IEEE Publishing USA
institution Thư viện Trường Đại học Đà Lạt
collection Thư viện số
language English
description Metallic junction engineering and tunnel field-effect architecture are the two major techniques to resolve the power dissipation issue of future transistor technologies. This work explores the on-off switching of metal source tunnel field-effect transistors. Two prime factors, source workfunction and dopants segregation, are utilized to optimize the subthreshold swing and on-current for serving as ideal energy-efficient devices.
format Conference paper
author Chun-Hsing Shih
Ting-Shiuan Kang
Yu-Hsuan Chen
Hung-Jin Teng
Nguyễn, Đăng Chiến
spellingShingle Chun-Hsing Shih
Ting-Shiuan Kang
Yu-Hsuan Chen
Hung-Jin Teng
Nguyễn, Đăng Chiến
Dopant-segregated metal source tunnel field-effect transistors with Schottky barrier and band-to-band tunneling
author_facet Chun-Hsing Shih
Ting-Shiuan Kang
Yu-Hsuan Chen
Hung-Jin Teng
Nguyễn, Đăng Chiến
author_sort Chun-Hsing Shih
title Dopant-segregated metal source tunnel field-effect transistors with Schottky barrier and band-to-band tunneling
title_short Dopant-segregated metal source tunnel field-effect transistors with Schottky barrier and band-to-band tunneling
title_full Dopant-segregated metal source tunnel field-effect transistors with Schottky barrier and band-to-band tunneling
title_fullStr Dopant-segregated metal source tunnel field-effect transistors with Schottky barrier and band-to-band tunneling
title_full_unstemmed Dopant-segregated metal source tunnel field-effect transistors with Schottky barrier and band-to-band tunneling
title_sort dopant-segregated metal source tunnel field-effect transistors with schottky barrier and band-to-band tunneling
publisher IEEE Publishing
publishDate 2024
url https://scholar.dlu.edu.vn/handle/123456789/3315
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