Negative capacitance in short-channel tunnel field-effect transistors

Based on band-to-band tunneling, tunnel field-effect transistors (TFETs) have demonstrated its small subthreshold swing for energy-efficient applications. This work explores the use of negative capacitance in extremely scaled short-channel TFETs. Against conventional MOSFETs and P-i-N TFETs, the sca...

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Những tác giả chính: Hung-Jin Teng, Yu-Hsuan Chen, Nguyễn, Đăng Chiến, Chun-Hsing Shih
Định dạng: Conference paper
Ngôn ngữ:English
Được phát hành: IEEE Publishing 2024
Truy cập trực tuyến:https://scholar.dlu.edu.vn/handle/123456789/3316
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spelling oai:scholar.dlu.edu.vn:123456789-33162024-03-02T12:39:42Z Negative capacitance in short-channel tunnel field-effect transistors Hung-Jin Teng Yu-Hsuan Chen Nguyễn, Đăng Chiến Chun-Hsing Shih Based on band-to-band tunneling, tunnel field-effect transistors (TFETs) have demonstrated its small subthreshold swing for energy-efficient applications. This work explores the use of negative capacitance in extremely scaled short-channel TFETs. Against conventional MOSFETs and P-i-N TFETs, the scaled asymmetric junctionless TFETs preserve the short-channel benefits of using negative capacitance ferroelectric to ensure boosted on-current with minimized swing. 1-2 2024-03-02T12:39:35Z 2024-03-02T12:39:35Z 2019 Conference paper Bài báo đăng trên KYHT quốc tế (có ISBN) 978-4-8634-8702-4 2161-4636 https://scholar.dlu.edu.vn/handle/123456789/3316 10.23919/SNW.2019.8782929 en Silicon Nanoelectronics Workshop (SNW) [1] Dmitri E. Nikonov and Ian A. Young, “Overview of beyond-CMOS devices and a uniform methodology for their benchmarking,” Proc. of the IEEE, p. 2498, 2013. [2] L. Liu, D. Mohata, and S. Datta, “Scaling length theory of double-gate interband tunnel field-effect transistors,” IEEE Trans. Electron Devices, p. 902, 2012. [3] C. M. Hu, S. Salahuddin, C. I. Lin, and A. Khan, “0.2V Adiabatic NC-FinFET with 0.6mA/ m ION and 0.lnA/um IOFF,” IEEE Annual Device Research Conference, pp. 39-40, 2015. [4] M. Kobayashi and T. Hiramoto, “Device design guideline for steep slope ferroelectric FET using negative capacitance in sub-0.2V operation: Operation speed, material requirement and energy efficiency,” in VLSI Symp. Tech. Dig., pp. T212–T213, Jun. 2015. [5] C.-H. Shih and N.-V. Kien, “Sub-10-nm asymmetric junctionless tunnel field-effect transistors,” IEEE J. Electron. Devi., pp. 128-132, Jun. 2014. [6] Synopsys Sentaurus Device User Guide, Synopsys Inc., Mountain View, CA, USA, 2016. IEEE Publishing USA
institution Thư viện Trường Đại học Đà Lạt
collection Thư viện số
language English
description Based on band-to-band tunneling, tunnel field-effect transistors (TFETs) have demonstrated its small subthreshold swing for energy-efficient applications. This work explores the use of negative capacitance in extremely scaled short-channel TFETs. Against conventional MOSFETs and P-i-N TFETs, the scaled asymmetric junctionless TFETs preserve the short-channel benefits of using negative capacitance ferroelectric to ensure boosted on-current with minimized swing.
format Conference paper
author Hung-Jin Teng
Yu-Hsuan Chen
Nguyễn, Đăng Chiến
Chun-Hsing Shih
spellingShingle Hung-Jin Teng
Yu-Hsuan Chen
Nguyễn, Đăng Chiến
Chun-Hsing Shih
Negative capacitance in short-channel tunnel field-effect transistors
author_facet Hung-Jin Teng
Yu-Hsuan Chen
Nguyễn, Đăng Chiến
Chun-Hsing Shih
author_sort Hung-Jin Teng
title Negative capacitance in short-channel tunnel field-effect transistors
title_short Negative capacitance in short-channel tunnel field-effect transistors
title_full Negative capacitance in short-channel tunnel field-effect transistors
title_fullStr Negative capacitance in short-channel tunnel field-effect transistors
title_full_unstemmed Negative capacitance in short-channel tunnel field-effect transistors
title_sort negative capacitance in short-channel tunnel field-effect transistors
publisher IEEE Publishing
publishDate 2024
url https://scholar.dlu.edu.vn/handle/123456789/3316
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