MOCVD of gallium nitride nanostructures using (N3)2Ga&(CH2)3NR2;, R= Me, Et, as a single molecule precursor : Morphology control and materials characterization /

MOCVD of gallium nitride nanostructures using (N3)2Ga&(CH2)3NR2;, R= Me, Et, as a single molecule precursor : Morphology control and materials characterization /

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Bibliographic Details
Other Authors: Birkner, Alexander., Devi, Anjana., Fischer, Roland A., Hambrock, Julia., Khanderi, Jayaprakash., Parala, Harish., Wohlfart, Andreas.
Format: Article
Language:English
Subjects:
Autocatalysis
Crystal growth habit
Inorganic compounds
Morphology
Nanocrystals
Nanostructures
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Institutions: Thư viện Trường Đại học Đà Lạt
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