MOCVD of gallium nitride nanostructures using (N3)2Ga&(CH2)3NR2;, R= Me, Et, as a single molecule precursor : Morphology control and materials characterization /

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MOCVD of gallium nitride nanostructures using (N3)2Ga&(CH2)3NR2;, R= Me, Et, as a single molecule precursor : Morphology control and materials characterization /

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Dettagli Bibliografici
Altri autori:	Birkner, Alexander., Devi, Anjana., Fischer, Roland A., Hambrock, Julia., Khanderi, Jayaprakash., Parala, Harish., Wohlfart, Andreas.
Natura:	Articolo
Lingua:	English
Soggetti:	Autocatalysis Crystal growth habit Inorganic compounds Morphology Nanocrystals Nanostructures
Tags:	Aggiungi Tag Nessun Tag, puoi essere il primo ad aggiungerne! !

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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