The science and engineering of microelectronic fabrication
Advanced processing topics such as rapid thermal processing, next generation lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacture...
保存先:
| 第一著者: | |
|---|---|
| その他の著者: | |
| 言語: | Undetermined English |
| 出版事項: |
New York
Oxford University Press
2001
|
| 主題: | |
| タグ: |
タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
|
| Thư viện lưu trữ: | Trung tâm Học liệu Trường Đại học Trà Vinh |
|---|
| 要約: | Advanced processing topics such as rapid thermal processing, next generation lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacture of integrated circuits. The text also discusses the integration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance tradeoffs are evaluated along with a description of current state-of-the-art devices. Each chapter includes sample problems with solutions |
|---|---|
| 物理的記述: | xiv, 603 p. ill. 24 cm |
| ISBN: | 0195136055 978-0195136050 |