Roles of gate-oxide thickness reduction in scaling bulk and thin-body tunnel field-effect transistors

Tunnel field-effect transistor (TFET) has recently been considered as a promising candidate for low-power integrated circuits. In this paper, we present an adequate examination on the roles of gate-oxide thickness reduction in scaling bulk and thin-body TFETs. It is shown that the short-channel perf...

وصف كامل

محفوظ في:
التفاصيل البيبلوغرافية
المؤلفون الرئيسيون: Nguyễn, Đăng Chiến, Dao Thi Kim Anh, Chun-Hsing Shih
التنسيق: Journal article
اللغة:English
منشور في: 2023
الموضوعات:
الوصول للمادة أونلاين:https://scholar.dlu.edu.vn/handle/123456789/2076
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