Design optimization of extremely short-channel graded Si/SiGe heterojunction tunnel field-effect transistors for low power applications

This study investigates, by a two-dimensional simulation, the design optimization of a proposed 8 nm tunnel field-effect transistor (TFET) for low standby power (LSTP) applications utilizing graded Si/SiGe heterojunction with device parameters based on the ITRS specifications. The source Ge mole fra...

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Egile Nagusiak: Nguyễn, Đăng Chiến, Luu The Vinh
Formatua: Journal article
Hizkuntza:English
Argitaratua: Publishing House for Science and Technology, Vietnam Academy of Science and Technology 2024
Gaiak:
Sarrera elektronikoa:https://scholar.dlu.edu.vn/handle/123456789/3294
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