Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3(E= CH, N) /

Documenti analoghi

• Atmospheric pressure chemical vapour deposition of Cr2-xTixO3(CTO) thin films (<=3 mmm) on to gas sensing substrates /
  di: Shaw, Graham A.
• Preparation of TiO2 thin films on polystyrene by liquid phase deposition /
  di: Dutschke, Anke.
• Growth of nanowires of beta-NaxV2O5 by metalorganic chemical vapor deposition /
  di: Sahana, M. B.
• Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass /
• Chemical vapour deposition of group Vb metal phosphide thin films /