Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3(E= CH, N) /
Sparad:
| Övriga upphovsmän: | Chang, Pei-Ju., Chang, Yu-Hsu., Chiu, Hsin-Tien., Wu, Jin-Bao. |
|---|---|
| Materialtyp: | Artikel |
| Språk: | English |
| Ämnen: | |
| Taggar: |
Lägg till en tagg
Inga taggar, Lägg till första taggen!
|
| Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
|---|
Liknande verk
-
Atmospheric pressure chemical vapour deposition of Cr2-xTixO3(CTO) thin films (<=3 mmm) on to gas sensing substrates /
av: Shaw, Graham A. -
Preparation of TiO2 thin films on polystyrene by liquid phase deposition /
av: Dutschke, Anke. -
Growth of nanowires of beta-NaxV2O5 by metalorganic chemical vapor deposition /
av: Sahana, M. B. - Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass /
- Chemical vapour deposition of group Vb metal phosphide thin films /