Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3(E= CH, N) /
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| 其他作者: | Chang, Pei-Ju., Chang, Yu-Hsu., Chiu, Hsin-Tien., Wu, Jin-Bao. |
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| 格式: | Bài viết |
| 语言: | English |
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| Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
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