Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3(E= CH, N) /

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Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3(E= CH, N) /

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Detalles Bibliográficos
Otros Autores:	Chang, Pei-Ju., Chang, Yu-Hsu., Chiu, Hsin-Tien., Wu, Jin-Bao.
Formato:	Artículo
Lenguaje:	English
Materias:	Inorganic compounds Reaction mechanism Tantalum complexes Thin films Transition element compounds
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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