Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3(E= CH, N) /

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Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3(E= CH, N) /

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Chi tiết về thư mục
Tác giả khác:	Chang, Pei-Ju., Chang, Yu-Hsu., Chiu, Hsin-Tien., Wu, Jin-Bao.
Định dạng:	Bài viết
Ngôn ngữ:	English
Những chủ đề:	Inorganic compounds Reaction mechanism Tantalum complexes Thin films Transition element compounds
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Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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