Nanoimprint lithography materials development for semiconductor device fabrication /

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Nanoimprint lithography materials development for semiconductor device fabrication /

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Opis bibliograficzny
Kolejni autorzy:	Costner, Elizabeth A., Jen, Wei-Lun., Lin, Michael W., Willson, C. Grant.
Format:	Artykuł
Język:	English
Hasła przedmiotowe:	Dual damascene Imprint template Nanofabrication Next-generation lithography
Etykiety:	Dodaj etykietę Nie ma etykietki, Dołącz pierwszą etykiete!

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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