Electromigration in ULSI Interconnections /

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Electromigration in ULSI Interconnections /

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書誌詳細
第一著者:	Tan, Cher Ming, 1959-
フォーマット:	Sách giấy
出版事項:	Singapore ; Hackensack, NJ : World Scientific, c2010.
シリーズ:	International series on advances in solid state electronics and technology.
主題:	Electrodiffusion. Integrated circuits > Ultra large scale integration.
タグ:	タグ追加タグなし, このレコードへの初めてのタグを付けませんか!

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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