Electromigration in ULSI Interconnections /

Electromigration in ULSI Interconnections /

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Bibliografski detalji
Glavni autor:	Tan, Cher Ming, 1959-
Format:	Sách giấy
Izdano:	Singapore ; Hackensack, NJ : World Scientific, c2010.
Serija:	International series on advances in solid state electronics and technology.
Teme:	Electrodiffusion. Integrated circuits > Ultra large scale integration.
Oznake:	Dodaj oznaku Bez oznaka, Budi prvi tko označuje ovaj zapis!

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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