Lonizing radiation effects in mos oxides
This volume is intended to serve as an updated critical guide to the extensive literature on the basic physical mechanisms controlling the radiation and reliability responses of MOS oxides.
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| Главный автор: | |
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| Формат: | |
| Язык: | Vietnamese |
| Опубликовано: |
Singapore
World Scientific
1999
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| Серии: | International advances in solid state electronics and technology
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| Thư viện lưu trữ: | Thư viện Trường Đại học Nam Cần Thơ |
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| 100 | |a Oldham, Timothy R | ||
| 245 | 1 | 0 | |a Lonizing radiation effects in mos oxides |c Timothy R Oldham |
| 260 | |a Singapore |b World Scientific |c 1999 | ||
| 300 | |a xiv, 171 p. |c 23cm | ||
| 490 | |a International advances in solid state electronics and technology | ||
| 520 | 3 | |a This volume is intended to serve as an updated critical guide to the extensive literature on the basic physical mechanisms controlling the radiation and reliability responses of MOS oxides. | |
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