Remote hydrogen-nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films /
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| Other Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Subjects: | |
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| Institutions: | Thư viện Trường Đại học Đà Lạt |
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