High-k/metal gate science and technology /

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High-k/metal gate science and technology /

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Bibliografski detalji
Glavni autor:	Guha, Supratik.
Daljnji autori:	Narayanan, Vijay.
Format:	Članak
Jezik:	English
Teme:	Capping layers Hafnium oxide Metal gates Mobility Oxygen vacancies
Oznake:	Dodaj oznaku Bez oznaka, Budi prvi tko označuje ovaj zapis!

Thư viện lưu trữ:	Thư viện Trường Đại học Đà Lạt

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