A VERY LOW BANDGAP LINE-TUNNEL FIELD EFFECT TRANSISTOR WITH CHANNEL-BURIED OXIDE AND LATERALLY DOPED POCKET

Low bandgap and line tunneling techniques have demonstrated the most effectiveness in enhancing the on-current of tunnel field-effect transistors (TFETs). This study examines the mechanisms and designs of channel-buried oxide and a laterally doped pocket for a very low bandgap line-TFET. Numerical T...

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Những tác giả chính: Bui, Huu Thai, Shih, Chun-Hsing, Nguyen, Dang Chien
格式: Bài viết
語言:English
出版: Trường Đại học Đà Lạt 2024
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在線閱讀:https://scholar.dlu.edu.vn/thuvienso/handle/DLU123456789/256919
https://tckh.dlu.edu.vn/index.php/tckhdhdl/article/view/1313
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