Device physics and design of hetero-gate dielectric tunnel field-effect transistors with different low/high-k EOT ratios
The hetero-gate dielectric (HGD) structure was recently experimentally demonstrated to enhance the electrical performance of tunnel field-effect transistors (TFETs). This study examined the mechanisms underlying the HGD structure functioning and investigated the design of the structure to enhance th...
में बचाया:
मुख्य लेखकों: | Chun-Hsing Shih, Nguyễn, Đăng Chiến, Trần, Hữu Duy, Phan, Văn Chuân |
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स्वरूप: | Journal article |
भाषा: | English |
प्रकाशित: |
Springer Nature
2024
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विषय: | |
ऑनलाइन पहुंच: | https://scholar.dlu.edu.vn/handle/123456789/3290 |
टैग : |
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Thư viện lưu trữ: | Thư viện Trường Đại học Đà Lạt |
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समान संसाधन
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Semiconductor-thickness-dependent design of hetero-gate dielectric in double-gate TFETs
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